TANG, Yifan. Advanced Photoresists: Development, Application and Market. Highlights in Science, Engineering and Technology, [S. l.], v. 29, p. 61–68, 2023. DOI: 10.54097/hset.v29i.4215. Disponível em: https://drpress.org/ojs/index.php/HSET/article/view/4215. Acesso em: 29 jun. 2026.