XU, Herong. Photoresist Fabrication for High-NA EUV Lithography: Material and Mechanism. Highlights in Science, Engineering and Technology, [S. l.], v. 76, p. 536–543, 2023. DOI: 10.54097/0rggyz09. Disponível em: https://drpress.org/ojs/index.php/HSET/article/view/16070. Acesso em: 6 may. 2026.