Progress of Physical Vapor Deposition’s Application in the Field of Solar Cells

Abstract

Solar cells are devices that convert solar energy into electricity, and the research on their performance is of great importance to relieving energy shortage. Physical Vapor Deposition (PVD) is a common technology used to enhance the performance of thin films on the surface of solar cells. This article comprehensively explains the application of PVD in the field of solar cells. It first introduces PVD’s basic principles and categories, which include vacuum evaporation, sputtering, and ion plating. Then, PVD’s specific application in different types of solar cells, such as monocrystalline silicon cells, polycrystalline silicon cells, thin-film cells, and perovskite solar cells, are discussed in detail. Its advantages in improving cell performances, such as improving photo-electric conversion efficiency and enhancing stability, are also analyzed. Meanwhile, the discussion covers the process parameter control, equipment characteristics, challenges faced, and future development trends of PVD in the preparation of solar cells. Research shows that PVD offers effective methods to improve solar cells’ performance and reduce their cost with its unique advantages in thin film preparation. It holds broad prospects for the future development of the solar energy industry.