Study on semiconductor materials for TFT and their application in flat panel displays

Meixuan Xiao

doi:10.54097/hset.v27i.3773

Authors

Meixuan Xiao

DOI:

https://doi.org/10.54097/hset.v27i.3773

Keywords:

Semiconductor materials, thin-film transistors, flat panel displays, application.

Abstract

TFT has been widely used in recent years because of its excellent performance. Considerable research has been done to meet the demand for high-quality and high-resolution displays, making the choice of well-suited and high-performance materials more significant than ever. This work first presents the overall development from a historic perspective. The next section introduces the basic structure of thin film transistors (TFTs), followed by recent advancements in semiconductor materials of TFT, including metal oxide, amorphous silicon, polycrystalline silicon, carbon nanotubes, and organic semiconductors. These materials are analyzed from various aspects: electrical properties, process temperature, fabrication complexity, mobility uniformity on large panels, and compatibility with substrates. After that, the properties of these materials are compared in terms of their large-scale fabrication capability in flat panel displays. Advantages and challenges are also discussed as each of the five materials is suitable for specific commercial products. This work provides a reference for the selection of TFT materials in future flat panel display industry.

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